Fundamentals Of MOSFET And IGBT Gate Driver Circuits .

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Application ReportSLUA618A – March 2017 – Revised October 2018Fundamentals of MOSFET and IGBT Gate Driver CircuitsLaszlo BaloghABSTRACTThe main purpose of this application report is to demonstrate a systematic approach to design highperformance gate drive circuits for high speed switching applications. It is an informative collection oftopics offering a “one-stop-shopping” to solve the most common design challenges. Therefore, it should beof interest to power electronics engineers at all levels of experience.The most popular circuit solutions and their performance are analyzed, including the effect of parasiticcomponents, transient and extreme operating conditions. The discussion builds from simple to morecomplex problems starting with an overview of MOSFET technology and switching operation. Designprocedure for ground referenced and high side gate drive circuits, AC coupled and transformer isolatedsolutions are described in great details. A special section deals with the gate drive requirements of theMOSFETs in synchronous rectifier applications. For more information, see the Overview for MOSFET andIGBT Gate Drivers product page.Several, step-by-step numerical design examples complement the application report.This document is also available in Chinese: MOSFET 和 IGBT ntsIntroduction . 2MOSFET Technology . 2Ground-Referenced Gate Drive . 15Synchronous Rectifier Drive . 22High-Side Non-Isolated Gate Drives . 25AC-Coupled Gate-Drive Circuits . 36Transformer-Coupled Gate Drives . 38Summary . 45References . 47List of Figures1Power MOSFET Device Types . 42Power MOSFET Models . 63Simplified Clamped Inductive Switching Model . 94MOSFET Turn-On Time Intervals . 105MOSFET Turn-Off Time Intervals . 116Typical Gate Charge vs. Gate-to-Source Voltage7Gate-Drive Resonant Circuit Components . 148Direct Gate-Drive Circuit9101112131415.Gate-Drive With Integrated Bipolar Transistors .Bipolar Totem-Pole MOSFET Driver .MOSFET-Based Totem-Pole Driver .Simple Turn-Off Speed Enhancement Circuit .Local pnp Turn-Off Circuit .Local NPN Self-Biasing Turn-Off Circuit .Improved N-Channel MOSFET-Based Turn-off Circuit .SLUA618A – March 2017 – Revised October 2018Submit Documentation FeedbackFundamentals of MOSFET and IGBT Gate Driver CircuitsCopyright 2017–2018, Texas Instruments Incorporated1215171718192020211

Introductionwww.ti.com16Simplified Synchronous Rectification Model . 2217Synchronous Switching Model18Direct Drive for P-Channel MOSFET . 2619Open Collector Drive for PMOS Device . 2620Level-Shifted P-Channel MOSFET Driver . 2721Direct Drive of N-Channel MOSFET . 2822Turn-Off of High-Side N-Channel MOSFET . 2923Integrated Bootstrap Driver . 3024Integrated Bootstrap Driver . 3125Typical Level-Shifter in High-Voltage Driver IC26High Voltage Driver IC for Bootstrap Gate Drive. 3227Protecting the SRC Pin . 3228Bootstrap Bypassing Example. 3329Bootstrap Start-Up Circuit . 3430Capacitive Currents in High-Side Applications . 3531Capacitively-Coupled MOSFET Gate Drive323334353637383940.Normalized Coupling Capacitor Voltage as a Function of Duty Ratio .Single-Ended Transformer-Coupled Gate Drive .Driver Output Current With Transformer-Coupled Gate Drive .DC Restore Circuit in Transformer-Coupled Gate Drive .Gate-Drive Transformer Volt-second Product vs. Duty Ratio .Power and Control Transmission With One Transformer .Power and Control Transmission With One Transformer .Push-Pull Type Half-Bridge Gate Drive .Push-Pull Type Half-Bridge Gate Drive .243136373940414243434445TrademarksAll trademarks are the property of their respective owners.1IntroductionMOSFET – is an acronym for Metal Oxide Semiconductor Field Effect Transistor and it is the keycomponent in high frequency, high efficiency switching applications across the electronics industry. Itmight be surprising, but FET technology was invented in 1930, some 20 years before the bipolartransistor. The first signal level FET transistors were built in the late 1950’s while power MOSFETs havebeen available from the mid 70’s. Today, millions of MOSFET transistors are integrated in modernelectronic components, from microprocessors, through “discrete” power transistors.The focus of this topic is the gate drive requirements of the power MOSFET in various switch mode powerconversion applications.2MOSFET TechnologyThe bipolar and the MOSFET transistors exploit the same operating principle. Fundamentally, both type oftransistors are charge controlled devices, which means that their output current is proportional to thecharge established in the semiconductor by the control electrode. When these devices are used asswitches, both must be driven from a low impedance source capable of sourcing and sinking sufficientcurrent to provide for fast insertion and extraction of the controlling charge. From this point of view, theMOSFETs have to be driven just as “hard” during turn-on and turn-off as a bipolar transistor to achievecomparable switching speeds. Theoretically, the switching speeds of the bipolar and MOSFET devices areclose to identical, determined by the time required for the charge carriers to travel across thesemiconductor region. Typical values in power devices are approximately 20 to 200 picosecondsdepending on the size of the device.2Fundamentals of MOSFET and IGBT Gate Driver CircuitsSLUA618A – March 2017 – Revised October 2018Submit Documentation FeedbackCopyright 2017–2018, Texas Instruments Incorporated

MOSFET Technologywww.ti.comThe popularity and proliferation of MOSFET technology for digital and power applications is driven by twoof their major advantages over the bipolar junction transistors. One of these benefits is the ease of use ofthe MOSFET devices in high frequency switching applications. The MOSFET transistors are simpler todrive because their control electrode is isolated from the current conducting silicon, therefore a continuousON current is not required. Once the MOSFET transistors are turned-on, their drive current is practicallyzero. Also, the controlling charge and accordingly the storage time in the MOSFET transistors is greatlyreduced. This basically eliminates the design trade-off between on state voltage drop, which is inverselyproportional to excess control charge, and turn-off time. As a result, MOSFET technology promises to usemuch simpler and more efficient drive circuits with significant economic benefits compared to bipolardevices.Furthermore, it is especially important to highlight for power applications, that MOSFETs have a resistivenature. The voltage drop across the drain source terminals of a MOSFET is a linear function of the currentflowing in the semiconductor. This linear relationship is characterized by the RDS(on) of the MOSFET andknown as the on-resistance. On-resistance is constant for a given gate-to-source voltage and temperatureof the device. As opposed to the -2.2mV/ C temperature coefficient of a p-n junction, the MOSFETsexhibit a positive temperature coefficient of approximately 0.7%/ C to 1%/ C. This positive temperaturecoefficient of the MOSFET makes it an ideal candidate for parallel operation in higher power applicationswhere using a single device would not be practical or possible. Due to the positive TC of the channelresistance, parallel connected MOSFETs tend to share the current evenly among themselves. This currentsharing works automatically in MOSFETs since the positive TC acts as a slow negative feedback system.The device carrying a higher current will heat up more – don’t forget that the drain to source voltages areequal – and the higher temperature will increase its RDS(on) value. The increasing resistance will cause thecurrent to decrease, therefore the temperature to drop. Eventually, an equilibrium is reached where theparallel connected devices carry similar current levels. Initial tolerance in RDS(on) values and differentjunction to ambient thermal resistances can cause significant – up to 30% – error in current distribution.SLUA618A – March 2017 – Revised October 2018Submit Documentation FeedbackFundamentals of MOSFET and IGBT Gate Driver CircuitsCopyright 2017–2018, Texas Instruments Incorporated3

MOSFET Technology2.1www.ti.comDevice TypesAlmost all manufacturers have their unique twist on how to manufacture the best power MOSFETs, but allof these devices on the market can be categorized into three basic device types. These are illustrated inFigure 1.SOURCEGATEn n p p n – EPI layern SubstrateDRAIN(a)SOURCEGATEn n ppn – EPI layern SubstrateDRAIN(b)SOURCEDRAINGATEOXIDEn n pnpSubstrate(c)Figure 1. Power MOSFET Device TypesDouble-diffused MOS transistors were introduced in the 1970’s for power applications and evolvedcontinuously during the years. Using polycrystalline silicon gate structures and self-aligning processes,higher density integration and rapid reduction in capacitances became possible.The next significant advancement was offered by the V-groove or trench technology to further increasecell density in power MOSFET devices. The better performance and denser integration do not come free;however, as trench MOS devices are more difficult to manufacture.The lateral power MOSFETs have significantly lower capacitances, therefore, they can switch much fasterand they require much less gate drive power.4Fundamentals of MOSFET and IGBT Gate Driver CircuitsSLUA618A – March 2017 – Revised October 2018Submit Documentation FeedbackCopyright 2017–2018, Texas Instruments Incorporated

MOSFET Technologywww.ti.com2.2MOSFET ModelsThere are numerous models available to illustrate how the MOSFET works, nevertheless finding the rightrepresentation might be difficult. Most of the MOSFET manufacturers provide Spice and/or Saber modelsfor their devices, but these models say very little about the application traps designers have to face inpractice. They provide even fewer clues how to solve the most common design challenges.A really useful MOSFET model that describes all important properties of the device from an applicationpoint of view would be very complicated. On the other hand, very simple and meaningful models can bederived of the MOSFET transistor if we limit the applicability of the model to certain problem areas.The first model in Figure 2 is based on the actual structure of the MOSFET device and can be usedmainly for DC analysis. The MOSFET symbol in Figure 2a represents the channel resistance and theJFET corresponds to the resistance of the epitaxial layer. The length, therefore, the resistance of the epilayer is a function of the voltage rating of the device as high voltage MOSFETs require thicker epitaxiallayer.Figure 2b can be used very effectively to model the dv/dt induced breakdown characteristic of a MOSFET.It shows both main breakdown mechanisms, namely the dv/dt induced turn-on of the parasitic bipolartransistor present in all power MOSFETs and the dv/dt induced turn-on of the channel, as a function of thegate terminating impedance. Modern power MOSFETs are practically immune to dv/dt triggering of theparasitic npn transistor due to manufacturing improvements to reduce the resistance between the baseand emitter regions.It must be mentioned also that the parasitic bipolar transistor plays another important role. Its base –collector junction is the famous body diode of the MOSFET.SLUA618A – March 2017 – Revised October 2018Submit Documentation FeedbackFundamentals of MOSFET and IGBT Gate Driver CircuitsCopyright 2017–2018, Texas Instruments Incorporated5

MOSFET Technologywww.ti.comDDGGSS(b)(a)DGS(c)Figure 2. Power MOSFET ModelsFigure 2c is the switching model of the MOSFET. The most important parasitic components thatinfluences switching performance are shown in this model. Their respective roles are discussed inSection 2.3, which is dedicated to the switching procedure of the device.2.3MOSFET Critical ParametersWhen switch mode operation of the MOSFET is considered, the goal is to switch between the lowest andhighest resistance states of the device in the shortest possible time. Since the practical switching times ofthe MOSFETs (approximately 10 ns to 60 ns) is at least two to three orders of magnitude longer than thetheoretical switching time (approximately 50 ps to 200 ps), it seems important to understand thediscrepancy. Referring back to the MOSFET models in Figure 2, note that all models include threecapacitors connected between the three terminals of the device. Ultimately, the switching performance ofthe MOSFET transistor is determined by how quickly the voltages can be changed across thesecapacitors.Therefore, in high speed switching applications, the most important parameters are the parasiticcapacitances of the device. Two of these capacitors, the CGS and CGD capacitors correspond to the actualgeometry of the device while the CDS capacitor is the capacitance of the base collector diode of theparasitic bipolar transistor (body diode).6Fundamentals of MOSFET and IGBT Gate Driver CircuitsSLUA618A – March 2017 – Revised October 2018Submit Documentation FeedbackCopyright 2017–2018, Texas Instruments Incorporated

MOSFET Technologywww.ti.comThe CGS capacitor is formed by the overlap of the source and channel region by the gate electrode. Itsvalue is defined by the actual geometry of the regions and stays constant (linear) under different operatingconditions.The CGD capacitor is the result of two effects. Part of it is the overlap of the JFET region and the gateelectrode in addition to the capacitance of the depletion region, which is non-linear. The equivalent CGDcapacitance is a function of the drain source voltage of the device approximated by Equation 1.CGD,0CGD »1 K1 VDS(1)The CDS capacitor is also non-linear since it is the junction capacitance of the body diode. Its voltagedependence can be described as shown in Equation 2.CDS CDS,0K 2 VDS(2)Unfortunately, non of the above mentioned capacitance values are defined directly in the transistor datasheets. Their values are given indirectly by the CISS, CRSS, and COSS capacitor values and must becalculated as shown in Equation 3:CGD CRSSCGS CISS - CRSSCDS COSS - CRSS(3)Further complication is caused by the CGD capacitor in switching applications because it is placed in thefeedback path between the input and output of the device. Accordingly, its effective value in switchingapplications can be much larger depending on the drain source voltage of the MOSFET. Thisphenomenon is called the “Miller” effect and it can be expressed as shown in Equation 4.CGD,eqv (1 gfs RL ) CGD(4)Since the CGD and CDS capacitors are voltage dependent, the data sheet numbers are valid only at the testconditions listed. The relevant average capacitances for a certain application have to be calculated basedon the required charge to establish the actual voltage change across the capacitors. For most powerMOSFETs the approximations shown in Equation 5.VDS,specCGD,ave 2 CRSS,spec VDS,offCOSS,ave 2 COSS,spec VDS,specVDS,off(5)The next important parameter to mention is the gate mesh resistance, RG,I. This parasitic resistancedescribes the resistance associated by the gate signal distribution within the device. Its importance is verysignificant in high speed switching applications because it is in between the driver and the input capacitorof the device, directly impeding the switching times and the dv/dt immunity of the MOSFET. This effect isrecognized in the industry, whereas, real high speed devices like RF MOSFET transistors use metal gateelectrodes instead of the higher resistance polysilicon gate mesh for gate signal distribution. The RG,Iresistance is not specified in the data sheets, but in certain applications it can be a very importantcharacteristic of the device. Appendix A4 shows a typical measurement setup to determine the internalgate resistor value with an impedance bridge.SLUA618A – March 2017 – Revised October 2018Submit Documentation FeedbackFundamentals of MOSFET and IG

Double-diffused MOS transistors were introduced in the 1970’s for power applications and evolved continuously during the years. Using polycrystalline silicon gate structures and self-aligning processes, higher density integration

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