BOOK OF ABSTRACTS - Eleventh International Conference
19 th – 20 thJUNE 2019BRAUNSCHWEIG» STADTHALLE BRAUNSCHWEIG« DEST – HIPIMS – ConferenceInternational Conference on Sputter Technology &10th International Conference on Fundamentals and Applications of HIPIMSBOOK OFABSTRACTSwww.st-conference.euSponsors & Conference Supporting Organisations:Society ofVacuumCoatersscientific partnerOrganisation:
10th International Conference on Fundamentals and Industrial Applications of HIPIMS – Braunschweig 2019 – Book of Abstracts3PrefaceDear colleagues,we are celebrating the 10th anniversary of the International Conference on Fundamentals and Applications ofHIPIMS this year in Braunschweig. We are looking back toa great evolution of one of the greatest developments insputtering that was ignited at the end of the last century.From the Sheffield HIPIMS days the HIPIMS Conferencewas born with the vision to grow the community, advancetechnological development, and expand the fundamentalunderstanding as well as the industrial implementation.Looking back, we can see that the joint activities fromSheffield Hallam University, Fraunhofer Institute forSurface Engineering and Thin Films IST and the Networkof Competence Industrial Plasma Surface TechnologyINPLAS play a key part in maturing this technology. TodayHIPIMS has become a well known technology and isused in several industrial applications and productionprocesses. Besides sputtering, also arc technology hasstrongly benefitted from developments in recent years,especially the development of advanced power suppliesand plasma diagnostics suited for high plasma densities.With the general development in PVD technology, severalrequests from industrial partners, and the more generaltechnological approach in commercial applications, thespectrum of sputter technologies covered up to now inthe HIPIMS conference will be broadened. Therefore,besides the 10th anniversary we are celebrating the launchof the International Conference on Sputter Technologywhich will be held in Braunschweig biannually jointly withthe HIPIMS conference. This marriage is also expressedin the conference’s short name ST-HIPIMS Conference.This year’s conference will link latest advances in HIPIMSand sputtering technology. The maturity of the HIPIMStechnology is reflected by one session presenting industrialcoating systems, process control and production processes.Nevertheless the fundamental aspects will be treated aswell as latest coating developments. Additionally, sputtering technology will be given a more general focus withhigh level contributions on ion beam sputtering, gas flowsputtering, and more general topics like surface integratedsensor systems or cyber-physical production systems insurface technology. To strengthen the active interactionbetween the participants different occasions are available:a guided poster session, face-to face discussions andmatch making at the industrial exhibition, active discussion at the new breakfast discussion forum, or thenetworking event with the awards ceremony.We are looking forward to an amazing event and youractive contribution to make this years ST-HIPIMS Conferencea unique and successful event!Dr. Ralf Bandorf and Prof. A. EhiasarianConference Chairman and Co-Chairman ofST-HIPIMS-Conference 2019 Stadtmarketing
410th International Conference on Fundamentals and Industrial Applications of HIPIMS – Braunschweig 2019 – Book of AbstractsContents pagePREFACE.3DSMC simulations of sputtered particle flux and gasrarefaction in DC and HIPIMS magnetron sputteringFLOORPLAN.6P. Zikán, A. Obrusník , J. Hnilica, N. Britun, P. Jelínek , P. Vašina.14LIST OF EXHIBITORS.7T3 or T5: Tungsten based conductive coatings for PEMWEbipolar platesL. Mendizabal.15ABSTRACTS ORAL PRESENTATIONTribological properties of low pressure plasma nitrided CoCrMo alloy using HIPIMS dischargeK. Shukla, A. A. Sugumaran, I. Khan, A. P. Ehiasarian,HiPIMS magnetized plasma afterglow diagnosticM. Ganciu, B. Butoi, A. Groza, B. Mihalcea.15On three different ways to quantify the degree ofionization in sputtering magnetronsP. Eh Hovespian.8D. Lundin, A. Butler, N. Brenning, M. A Raadu, J. T. Gudmundsson,T. Minea.16High-performance thermochromic VO2-based coatings prepared on glass by a low-temperature (330 C)scalable techniqueDesign of Experiment methods as an effective tool inindustrial implementation of HIPIMS technologyJ. Vlček, D. Kolenatý, T. Bárta, J. Rezek, J. Houška, S. Haviar.8Super thin CrN coatings with high emissivity on bariumfluoride to investigate heat flux of bubble formationA. Martin, H. Scheerer, T. Engler, M. Oechsner.9Advanced HIPIMS coatings through Kick pulse technologyJ. Hrebik.10High deposition rate films prepared by reactive HiPIMSP. Mareš, M. Dubau, A. Marek, J. Vyskočil, J Čapek, T. Kozák.10Comparison of Langmuir probe and laser Thomsonscattering for plasma density and electron temperaturemeasurements in HiPIMS plasmaP. J. Ryan, J. W. Bradley, M. D. Bowden.11HIPIMS/UBM PVD coating equipment designed to coatuniversal sized broachesW.-D. Münz, R. Klink, D. Aleksic.12Influence of high voltage discharge on the plasma nitridedzoneC. Kipp, P. Kaestner, G. Bräuer.12Combined control of ionization and stoichiometry inreactive highly ionized processes for production linesT. Schütte, P. Neiß,, J. Rieke, G. Bräuer,,H. Gerdes,R. Bandorf, G. Bräuer.13Emerging power supply technologies facilitate enhancements of magnetron sputtering for demanding complexthin films.G. Eichenhofer, G. Moser, M. Schweiger; M. Banghard;H. Steins.13W. Gajewski, R. Mroczyński, M. Betiuk, M. Puźniak, P. Domanowski, P. Różańsk, M. Żelechowski.17A novel industrial coating system for the deposition ofsmooth hard coatings combining HiPIMS V and rotatablemagnetronsH. Gabriel, I. Fernandez, J.-A. Santiago, A. Wennberg.17HIPIMS with positive voltage reversal: a method forinfluencing the coating properties on insulatingsubstrates.A. Wennberg, I. Fernández.18Study of Molybdenum Plasma by HIPIMSD. A. L. Loch, A. P. Ehiasarian.18Options to Tailor Thin Film Properties by Ion Beam SputterDepositionC. Bundesmann, T. Amelal, R. Feder, D. Spemann.19Roll-to-Roll Gas Flow Sputter Deposited CopperC.-M. Chen, S.-Y. Chen,Y.-H. Chen, P.-Y. Hsieh, T.-H. Chen, K.-B. Cheng, J.-L. He.20Plasma Chemistry, Crytal Growth and Mechanical Properties of CrAlYN / CrN Nanoscale Multilayer CoatingsDeposited by High Power Impulse Magnetron SputteringA.P. Ehiasarian, A. Sugumaran, P.Eh. Hovsepian.21
10th International Conference on Fundamentals and Industrial Applications of HIPIMS – Braunschweig 2019 – Book of AbstractsContents pageABSTRACTS POSTER PRESENTATIONSpatial and temporal measurements of plasma parameters in a bipolar HiPIMS dischargeOn ionization fraction of sputtered speciesK. Bernátová, M. Fekete, P. Klein, J. Hnilica, P. Vašina.31F. Walk, R. Valizadeh, J.W. Bradley.25Spatial distribution of the plasma potential for differentmagnetron magnetic configurations in HiPIMSwith positive pulses.Overstoichiometric TMNx 1 transition metal nitridesI. Fernandez-Martinez, V. Bellido.32Z. Čiperová, J. Musil, Š. Kos, M. Jaroš.25On the effect of stationary magnetic field on spatialdistribution of deposition rate and ionized flux fractionin the HiPIMS dischargeDesign, preparation and investigation of tunable metaldielectric coatings for plasmonic applicationsA. Belosludtsev, D. Buinovskis, N. Kyžas.32H. Hajihoseini, J. T. Gudmundsson.26Gas Flow Sputtering of AlNx Thin Films as a HighTemperature Strain GaugeTime-resolved Langmuir probe diagnostics carried outduring the positive voltage puses in bipolar HiPIMSdischargesJ. Rivera.33A.D. Pajdarová, T. Kozák, J. Čapek, P. Mareš, M. Čada,Z. Hubička.26Photocatalytic Ta-O-N films prepared by reactive HiPIMSŠ. Batková, J. Čapek, S. Haviar, J. Houška, R. Čerstvý, M. Krbal,T. Duchoň.27YmOn and YTTRIUM Doped ZnO thin films and multilayersH. Arslan, A. Azens, M. Zubkins, J. Purans.28Cryogenic deposition of thin films by reactive magnetronsputteringM. Zubkins, J. Gabrusenoks, G. Cikvaidze,L. Bikse, J. Purans.28Movement of sputtered particles in the target region ofHiPIMSJ. Held, W. Breilmann, A. von Keudell,V. Schulz-von der Gathen.29Growth of nanostructured ω-Phase Titanium filmsdeposited by biased HiPIMSD. Dellasega, F. Mirani, D. Vavassori, C. Conti, M. Beghi,M. Passoni.30Effect of magnetron sputtering deposition parametersonto electrical and optical properties of HfOxNy thin filmsM. Puźniak, R. Mroczyński, W. Gajewski, P. Różański,M. Żelechowski.30Plasma Emission monitor for controlling the ion to neutralratio and stoichiometry of HIPIMS processesH. Gerdes, J. Rieke, R. Bandorf, T. Schütte, M. Vergöhl,G. Bräuer.33Surface processes of energetic metal ions on HiPIMStarget materials analysed by ion beam sputteringR. Buschhaus, M. Budde, A. von Keudell.34LIST OF AUTHORS.35-36CONFERENCE COMMITTEES.375
610th International Conference on Fundamentals and Industrial Applications of HIPIMS – Braunschweig 2019 – Book of AbstractsFloorplanDno. ExhibitionBA Reception-DeskB AuditoriumC CateringD Elevator1123456789101112E Trumpf HüttingerSponsorPlasusSponsor810VON ARDENNENano4EnergyPVTAvaluxe & ulsPREVAC5C151171618141912CemeConLeskerSheffield HallamUniversityINPLASFraunhofer ISTE20C
10th International Conference on Fundamentals and Industrial Applications of HIPIMS – Braunschweig 2019 – Book of AbstractsList of Exhibitors123MELEC GmbHBaden-Baden, DEwww.melec.deHiden Analytical Ltd.Warrington, UKwww.hidenanalytical.com11 PVTBensheim, Germanywww.pvtvacuum.de/12 AvaluxeInternational GmbHIonbondNetherlands BVGmbH14 LeyboldKöln, GermanyVenlo, NLwww.ionbond.com5www.nano4energy.euIHI HauzerTechno CoatingVenlo, NLwww.hauzertechnocoating.com410 Nano4EnergyMadrid, SpainTRUMPF HüttingerGmbH Co. KGNürnberg, Germanywww.avaluxe.dewww.lesker.com15 ImpedansDublin, Irelandwww.impedans.comFreiburg, Germanywww.huettinger.com67PlasusMering, Germanywww.plasus.deMAGPULS GmbHSinzheim, Germanywww.magpuls.derobeko GmbH & Co. KGMehlingen, Germanywww.robeko.de8VON ARDENNE GmbH9PREVAC sp. zo.o.Dresden, Germanywww.vonardenne.bizRogów, Polandwww.prevac.euAG16 CemeConWürselen, Germanywww.cemecon.deJ. Lesker17 KurtCompanyHastings, UKwww.lesker.comHallam University18 SheffieldSheffield, UKwww.sheffield.ac.ukNetwork of Competence19 INPLAS e. V.Braunschweig, Germanywww.inplas.de20 Fraunhofer Institute forSurface Engineering andThin FilmsBraunschweig, Germanywww.ist.fraunhofer.de7
810th International Conference on Fundamentals and Industrial Applications of HIPIMS – Braunschweig 2019 – Book of Abstractsoral presentationAbstract 1Tribological properties of lowpressure plasma nitrided CoCrMoalloy using HIPIMS dischargeKrishnanand Shukla*, Arunprabhu A.Sugumaran1, Imran Khan2, A. P. Ehiasarian1,P. Eh Hovespian1National HIPIMS Technology Centre, Materials and EngineeringResearch Institute, Sheffield Hallam University, UK S1 1WB.*Corresponding authorE-mail: krishnanand.shukla@student.shu.ac.ukCoCrMo is a biomedical grade alloy which is widely used inthe manufacturing of orthopaedic implants such as hip andknee replacement joints because it has high hardness, bettercorrosion resistance, and excellent biocompatibility. However, the major concern is the release of toxic metal ions dueto corrosion and wear of the alloy, which causes an allergicreaction in the human body. Over the years various surfacemodification techniques including nitriding have been usedto improve the performance of CoCrMo (F75) alloy.In the current work a new low pressure plasma nitridingprocess is described. Unlike convetional plasma nitriding theprocess utilised HIPIMS discharge sustained on one Cr targetat low power to further enhance the ionisation of the gas inthe vacuum chamber and avoid coating deposition.The nitriding of CoCrMo alloy has been carried out in a widerange of nitriding voltages (from -500 V to -1100 V) at 4000C.The chemical and phase composition of the nitrided layerhas been studied by various advanced surface analysestechniques.The X-ray diffraction data of all nitrided samples revealedthe formation of expanded austenite (ϒN) phase.Texture analyses revealed that at lower nitriding voltages(UN -700V) the predominant crystallographic orientation ofthe compound layer is (200) whereas at higher voltages(UN -900V, -1100V) the layer develops mixed (111)and (200) texture. For samples nitrided at lower, UN - 500V substrate bias, diffraction peaks for CrN/NbN and Cr2Nwere also observed due to the deposition of target mate-rials (Cr and Nb). However, no coating deposition on thesubstrate surface was observed at higher (UN 700V andhigher) bias voltages due to sufficient re-sputtering effect.The results obtained from secondary ion mass spectrometry(SIMS) and glow discharge optical emission spectroscopy(GDOES) depth profiling have showed that the depth ofnitriding increased from approximately 0.7 µm at -500 Vto 6 µm at -1100 V. In pin-on-disc tribological test nitridedsamples showed low coefficients of friction (COF) in therange of µ 0.6 to µ 0.7, compared to µ 0.8 recordedfor un-treated substrate. The wear coefficients (Kc) werefound to be between 1.79x10-15 m3N-1m-1 (UN -700 V)and 4.62x10-15 m3N-1m-1 (UN -1100 V) which were oneorder of magnitude lower as compared to the untreatedsubstrate, 6x10-14 m3N-1m-1. The nanohardness (H) ofnitrided samples significantly increased by a factor of 3(22 GPa at Ub -1100 V) as compared to the untreatedsubstrate, 6 GPa showing the high efficiency of the process.Abstract 2High-performance thermochromic VO2-based coatings prepared on glass by a low-temperature (330 C) scalable techniqueJ. Vlček, D. Kolenatý, T. Bárta, J. Rezek,J. Houška, S. HaviarDepartment of Physics and NTIS – European Centre ofExcellence, University of West Bohemia, Univerzitni 8,306 14 Plzen, Czech Republic*Corresponding authorE-Mail: vlcek@kfy.zcu.czThermochromic VO2-based coatings were prepared onsoda-lime glass by a low-temperature scalable depositiontechnique. This deposition technique is based on reactivehigh-power impulse magnetron sputtering with a pulsedO2 flow control [1] allowing us to prepare crystalline VO2layers of the correct stoichiometry under highly industryfriendly deposition conditions: without any substrate biasat a low substrate temperature of 330 C. Simultaneous
10th International Conference on Fundamentals and Industrial Applications of HIPIMS – Braunschweig 2019 – Book of Abstractsdoping of VO2 by W (resulting in a V1-xWxO2 compositionwith x 0.018 in this work) was performed to reduce thesemiconductor-to-metal transition temperature to 20 C. ZrO2 antireflection layers both below and above thethermochromic V0.982W0.018O2 layers were deposited ata low substrate temperature ( 100 C). A coating designutilizing a second-order interference on the ZrO2 layers[2] was applied to increase both the luminous transmittance, Tlum, and the modulation of the solar transmittance, Tsol. The crystalline structure of the bottom ZrO2layer further improved the VO2 crystallinity and theprocess reproducibility. The top ZrO2 layer provided themechanical protection and environmental stability of theV0.982W0.018O2 layers. The ZrO2/V0.982W0.018O2/ZrO2coatings exhibited Tlum up to 60% at Tsol close to 6% fora V0.982W0.018O2 thickness of 45 nm, and Tlum up to50% at Tsol above 10% for a V0.982W0.018O2 thicknessof 69 nm. The results are important for a low-temperaturefabrication of high-performance durable thermochromicVO2-based coatings for smart-window applications.1. J. Vlček, D. Kolenatý, T. Kozák, J. Houška, J. Čapek, Š. Kos, Ion-fluxcharacteristics during low-temperature (300 C) deposition of thermochromic VO2 films using controlled reactive HiPIMS, J. Phys. D: Appl.Phys. 52 (2019) 025205., 2. J. Houska, D. Kolenaty, J. Vlcek,T.Barta, J. Rezek,R. Cerstvy, Significant improvement of the performanceof ZrO2/V1-xWxO2/ZrO2 thermchromic coatings by utilizing a secondorder interference, Sol. Energy Mater. Sol. Cells 191 (2019) 365-371.Abstract 3Super thin CrN coatings withhigh emissivity on barium fluoride to investigate heat flux ofbubble formationA. Martin*1, H. Scheerer, T. Engler,M. OechsnerIn many technical processes such as for example microfluidic, Lab-on-a-chip technology and cooling technology thebubble formation properties on the surfaces in fluids playan important role. Wetting as well as dewetting processesare mutual and closely connected to local impulse, heatand mass transport processes. These nano- and microscopic processes and their interactions determine in many casessignificantly the efficiency of the whole technical processas well as the quality of the resulting products. Of highinterest is the three phase contact line (fluid, gas, solid).Therefore, a complex setup is developed to determinesmall dimensional heat transfer processes in high resolution. The work is being done in cooperation with the Institute of Technical Thermodynamic Technical UniversityDarmstadt and Airbus-Defence and Space for experimentson the International Space Station (ISS) and in parabolicflights. The main component is a heater made of a PVDbilayer on a barium fluoride single crystal substrate.On top a Cr coating is working as an active heating element.To investigate the three phase contact line on the back sideto the crystal a very thin, low electrical resistance coatingwith high emissivity (wavelength 8 -10 μm) is needed.A combination of High Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron Sputtering(DCMS) technology with different bias voltage, nitrogenproportion and thickness of the coating was used to investigate the influence of these parameters on the emissivityand lattice ori
of the International Conference on Sputter Technology which will be held in Braunschweig biannually jointly with the HIPIMS conference. This marriage is also expressed in the conference’s short name ST-HIPIMS Conference. This year’s conference will link latest advances in HIPIM
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and must include the following sections: Introduction, Methods, Results, Discussion. These abstracts will be considered for oral or poster presentation. Clinical vignette or case report abstracts should focus on a case or cases involving 5 or fewer patients. These abstracts are considered for poster presentation only, which allows for an
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