Tanner EDA L-edit (Layout Editor) - Tufts University
Tanner EDA L-edit (Layout Editor)Tanner Tools “Speeding Concept to Silicon”EDA “Electronic Design and Automation”NOTE: This tutorial wasconstructed in L-editversion 1.15 (c. October2007)http://www.tanner.com/eda/ Robert White 2012
LayoutLayout is essentially adrawing process. Youare drawing the twodimensional geometriesthat will end up on yourmask. Layout tools areessentially CAD drawingtools, but includeadditional usefulfeatures.Every area of each maskwill be either opaque orclear. That is what youare trying to define which areas are which. Robert White 2012
Files and TapeoutYour end product is a file which contains the data for your mask. Theprocess of transmitting the data to a foundry who will build your device iscalled “tapeout” you are sending your magnetic tape out.Standard format is GDSII (“Graphic Data System” – Version II). It includesinformation on the layers of your design and the 2D geometries.OASIS (Open Artwork System Interchange Standard) is a new (2004)specification which is attempting to replace GDSII. It is more efficient in itsstorage format (10-50 times) than GDSII.Other common formats are CIF (Caltech Interchange Format), DXF(Drawing Exchange Format AutoCAD), and Gerber (Printed CircuitBoard PCB) files.Sometimes companies will charge you an additional fee to convert yourCAD format into GDSII so they can make your masks. Robert White 2012
Layout EditorsCommercial Code:Cadence “Virtuoso”Mentor Graphics “IC Station”Tanner EDA “L-edit”IC Industry LeadersMEMS CentricFreeware:MagicIC Centric, established Gnu softwareLayout EditorIC and MEMS, Freeware,Reads/writes GDSII, CIF, DXF,OASIS Robert White 2012
Why Tanner EDA L-edit?MEMS Centric : Includes curved features!License is less expensive the Cadence/MentorGraphics.Runs on PC (not UNIX).Better than freeware (although Layout Editorlooks pretty good!)But any of them would work just fine(except for Magic, maybe). I did my PhD workin Mentor Graphics. Tufts ECE uses Cadencefor VLSI work. Robert White 2012
Goal:We have a 3 layer process with a 4 micron minimum feature size.The three layers are:(1) A silicon nitride structural layer (“nitride” GDSII layer 1)(2) An anchor layer where we etch through our oxide to attach thebeam (“anchor” GDSII layer 2)(3) A metal layer for use as a strain gauge and as electricalconnections (“metal” GDSII layer 3)I want to design a cantilevered beam with a metal strain gauge on it. Robert White 2012
Launch L-editFile andCell NameLocationToolbarsAerial ViewLayer PaletteDrawingWindowMouseButtonsStart MenuEngineeringand ScienceAppsL-edit v12.1 Robert White 2012
Make a New FileThis will create a new layout with aname like “Layout1” and with a singlecell, “Cell0”. Robert White 2012Make a new file oftype “Layout”.“TDB” is “TannerDataBase” yourlayout will be savedin a TDB file, aproprietary Tannerformat. If you wantto copy setupinformation from anexisting TDB file,browse to it. (Forinstance, this couldcopy Design Rulesand Layer Names).Select empty for anew file with nosetup information.
Setup TechnologyGo to Setup Design.Technology tab.As displayedon screen.Microns is agood default.Create a name foryour fabricationprocess.This is the unit in thetechnology that is, thefabrication process.What is the natural unit towork in? For 0.18 micronprocess, it would be 0.18microns.Internal units are what is actually used in L-edit to store the information.This is not what is displayed to you (see display units above). However,you need to know this when you export your final design to GDSII. Thedefault for GDSII is that one database unit is 1 nm (1/1000 microns). Robert White 2012
Setup TechnologyThis is the unit in thetechnology that is, thefabrication process.What is the natural unit towork in? For 0.18 micronprocess, it would be 0.18microns. Then you wouldhave “technology units” oflambda, where 1lambda 0.18 microns.For our purposes, it isbest to leavetechnology units as 1micron.Internal units are what is actually used in L-edit to store the information.This is not what is displayed to you (see display units above). The default is1 nm (1/1000 microns), which is the same as GDSII default. This will bethe smallest increment you can store, and will also determine the max sizeof your design (L-edit max size is -536,870,912 to 536,870,912 units) at1 nm 1 internal unit, this is something like 42 inches on a side. Keepdefault of 1 nm per internal unit. Robert White 2012
Setup Design GridThese are just thedots shown on thescreen.This is where yourmouse will snap to. Ifyou want to make sureyou don’t makeanything smaller thanyour minimum featuresize, set the mousesnap grid to yourminimum feature size.This is the minimumfeature you can make inyour process. Robert White 2012
Setup LayersCreate all the layers you want in your design. Easiest thing would be onelayer per mask. You can set the appearance of the layer (color andpattern) under “rendering”. We will talk about derived layers later. Robert White 2012
Setup LayersWhen youexport toGDSII orCIF, thislayer willbeexportedas thatGDSII orCIF layer.Used byL-edit don’tmess withthem.Add layers you want definetheir name and rendering. Robert White 2012If you plan to make wires in thatlayer, you can set a default wirewidth and end/join style.
Wire Default Meanings Robert White 2012
Do This:1) Create a new layout with an empty setup.2) Make sure working units are microns andinternal units are nm.3) Set mouse snap to 1 micron andmanufacturing grid to 4 microns.4) Define three layers: nitride, anchor, andmetal. Give them some interestingcolor/pattern so you can tell them apart.5) Define the default wire width on metal tobe 4 microns.6) Set the GDSII layer numbers to 1 for poly,2 for anchor and 3 for metal. Robert White 2012
LayersYou can also selectlayers here.You can selectwhether Drawn,Generated, Special,or All layers arevisible in thepallete.Here are all the layersin your layout. Theycan corresponddirectly to masks, orthey can correspondto logical units (suchRight click overas anchors, holes,layer palette tostructures, channels)“show all”, “hide all”,which may eventuallyetc.be group together intoa single layer to makeMouse over a layer button to make theyour mask.layer active, and to hide and show it. Robert White 2012
CellsThis is the name of thecell within the currentlayout. You can havemultiple cells within asingle layoutA cell within your layout is some logical entity; often something you want toduplicate many times. For instance, if you have a layout with many identical chipsin it, you may design the chip as a single cell, and then array the cell many times tocreate the overall layout. Then if you need to make a change you just change thecell and all the instances of that cell update.Make a new cell called “Cantilever” Robert White 2012
DrawingRight click and select“All Angle and Curve”To add curve tools forcircles and arcs andtoroids. Robert White 2012
DrawingPolygonsCircles andwedgesWiresChoose your drawingtool.Left click to select yourworking layer. Robert White 2012
MousingThis will displaythe current cursorlocation.As you mouse around, this spotshows which each mouse buttondoes. If you hold down shift,control, or alt, you will getdifferent options. Robert White 2012
SelectingAt the bottom left of thescreen it will tell you whatyou selected. Robert White 2012Choose your select tool. You can onlyselect items on visible layers.
EditingSelect the object youwant to edit and press“Ctrl-e”. A dialogue boxwill pop up you canchange the layer theobject is on, thedimensions of the objectand so forth. Robert White 2012
MovingOptions:(1) Select the object anddrag it with the middlebutton.(2) Select the object andpush “m”. You candefine an exact move.Left click this tobe able toselect a basepoint. Robert White 2012(3) Select an object. Seta “base point” at somelocation on the object.Now middle clickwhere you want thatobject to move to that point on theobject will move there.
CopyingOptions:(1) Select an object,duplicate it (Ctrl-d),and then move thenew object.(2) Select the object set abase point. Push“Ctrl-c” to copy theobject. Push “Ctrl-v”,and then middle clickwhere you want thenew object to appear.Left click this tobe able toselect a basepoint. Robert White 2012
More EditingRotateFlipSliceMergePerform booleanoperations (And, Or,Subtract, Shrink andGrow and results canend up on any layer.)NibbleThese are all available from the “Draw” menu as well. Robert White 2012
Zooming and Panning and – keys zoom in and out. “Home” key zooms to see everything. “z” key puts you in zoom mode, then left buttonzooms in on a boxed area, middle button pans, rightbutton zooms out. Arrow keys pan around the design. Robert White 2012
MeasuringYou can use a 90 degree, 45 degreeor all angle ruler. It will tell you theruler length at the bottom left of thescreen. If you want to read the rulerwriting, you may need to select andedit the ruler and change font size. Robert White 2012If you push “q” yourcurrent cursor locationwill become 0,0 and youcan move to a new spotand see where you are.Push “q” again to goback to globalcoordinates.
Object SnapYou can determinewhat kinds of things(vertex, edge,center, etc.) yousnap to by selectingthese buttons. Robert White 2012Turn on object snapif you want it byclicking this magnetbutton.
Arraying CellsOnce you have a celldesigned, you can array it.Go up to your top level cell(Cell0). (Use “window”menu)Say “cell instance” andselect the cantilever cell.Then push Ctrl-e to edit cellparameters, includingarraying. Robert White 2012
Grouping ObjectsYou can group objectsthat you have alreadydrawn together tocreate a new cell.Select the objects andpush “Ctrl-g”.Then if you want toarray them, go aheadand do that by editingthe cell.To swap back so thoseobjects are now part ofyour top level existingcell as polygons ratherthan as arrays of cells,ungroup them “Ctrl-u”twice. Robert White 2012
1) Draw a cantilever inthe nitride layer.Make it 100 micronslong, 20 microns wide.2) Draw a box in thenitride layer which isattached to the baseof the cantilever.Make it 500 micronssquare.3) Create an anchor(where the nitride willgo down to anchor tothe substrate) in the“anchor” layer byshrinking the 500square micron box by4 microns. Robert White 2012Do This:
1) Create 100 micron square“pads” within the anchorregion which are offset 100microns in x and 50microns in y from the backcorners of the anchor largenitride region.2) Create a four micron widewire in the metal layer ,spaced evenly by fourmicrons, that extendsdown 40% of the beamlength and comes back offthe beam. Wire it to bothpads with 20 micron widewires.3) Merge all the wires and thepads into one single metalpolygon. Robert White 2012Do This:
Do This:1) Create a new layercalled “Ruler” which isblack in color.2) Use object snap todraw rulers in that layerto show all thedimensions as donebelow. Robert White 2012
1) Go back up to Cell0.2) Create a new layercalled “wafer”. In thatlayer, draw a 100 mmdiameter circle centeredat 0,0. This is the fullsize of a four inchwafer.3) Create an instance ofthe cantilever cell.4) Array the instance witha spacing of 800microns in x, 700microns in y. Make a100 x 100 array.5) Move the array by halfits size back so it iscentered on the wafer. Robert White 2012Make a Cell Array
Generating TextText can be auto-generated by using thecommand:Draw Layout Generators Layout Text GeneratorStringLayer to putthe text inText height Robert White 2012Name of thecell that will becreated.
Generating TextAdd a plusand minussign to themetal layer inyour layout todistinguishyour twoconnectionpads.Since this cellis instancedin an array onCell0, all theinstances willupdate!! Robert White 2012
Generating the Final GDSIIMake sure thelayers you careabout are nothidden!!!!UsedefaultGDSIIthat oneGDSIIdatabase unit is1 nm.Choose whichcell to export.All sub-cells willbe exported too.GDSII polygons have a maximum # of vertices thiswill break up any huge polygons (especially curves!)into manageable smaller pieces. Robert White 2012
Check the logthat pops up forerrors orwarnings. Robert White 2012
Generating the Final GDSIIYou can look atthe final GDSIIin Layout Editorto make sureeverythinglooks right. Theunits in layouteditor are alsomicrons.The layers ofyour final maskpolygons weredefined by theGDS layer youset up at theLayer Setupstage. Robert White 2012
Darkfield/LightfieldMake sure you are clearon your vendorsconventions!!!Do you want the regionsthat you “digitized”(colored in) to beopaque? That’s probablya lightfield mask (the“field” is transparent).Do you want the regionsthat you “digitized”(colored in) to betransparent? That’s adarkfield mask (the “field”is opaque). Robert White 2012“Digitize clear” Darkfield“Digitize dark” LightfieldThese particular conventions are from the “photoplotstore” who I will be using to make your masks.
MirroringIf you do not ask the vendor to mirroryour design, the mask will bemanufactured so that when you look atthe Chrome side, you will see what youdrew on the screen.This will get flipped over when youexpose the wafer, so the pattern on thewafer will be the mirror image of whatyou drew. If you do a molding step, orare working on the backside of the wafer,you get mirrored again.Tell the mask vendor if you want thedesign mirrored or not. Robert White 2012Mask has beenmirroredMask has not beenmirrored
Derived Layers To create a derived layer:o Go to ‘Setup’ – ‘Layers’oSelect the layer you want to make a derived layer or create anew layer If you create a new layer, make sure you go to the renderingtab under that new layer and give it a coloroClick on the ‘Derivation’ tab and then click on the ‘Derived’ buttonoYou can enter in the derivations you would like in your new layer ***Look at the ‘Layers’ list on the left side of the menu. Yourderived layer must be below the layers you would like to usein your derivations.oClick OK To derive the layer:oGo to ‘Tools’ – ‘Generate layers’oMake sure the ‘Standard derived layers’ box is checked in the topmenu.oSelect your derived layer from the bottom listoClick ‘Run’ and your layers should be created Robert White 2012Thanks to Andrew Mueller
Additional FeaturesDesign Rule Checker (DRC)The fabrication process, particularly if you are using afoundry, will have a large number of design rules. Thedesign rule checker can automatically check if yourdesign violates any of these rules. This can be useful forMEMS.Schematic CaptureUsed mainly by IC designers. Taking a schematicdrawing and turning it into a layout automatically. SomeMEMS people have worked on this, but it is harderbecause all MEMS structures are very different, therereally aren’t standard components.Parameter ExtractionOnce you have your layout, you can extract parameters(usually electrical ones) like resistance, capacitance, andinductance of lines. Robert White 2012
“pads” within the anchor region which are offset 100 microns in x and 50 microns in y from the back corners of the anchor large nitride region. 2) Create a four micron wide wire in the metal layer , spaced evenly by four microns, that extends down 40% of the beam length and comes back off the beam. Wire it to both pads with 20 micron wide .
1.Exploratory Data Analysis This chapter presents the assumptions, principles, and techniques necessary to gain insight into data via EDA--exploratory data analysis. 1. EDA Introduction 1. What is EDA? 2. EDA vs Classical & Bayesian 3. EDA vs Summary 4. EDA Goals 5. The Role of Graphics 6. An EDA/Graphics Example 7. General Problem Categories 2 .
Tanner Tools 2016.2 are no longer supported as of January 2020. Additional information on supported platforms is available at "Installation and Application Requirements" in the Tanner Administrator's Guide. RHEL Support The Tanner 2021.2 release is the last release to support RHEL 6.8. Future major Tanner releases will only support RHEL 7.
Tanner EDA is a suite of tools for the design of integrated circuits. These tools allow you to enter schematics, perform SPICE simulations, do physical design (i.e., chip layout), and perform design rule checks (DRC) and layout versus schematic (LVS) checks. There are 3 tools that are used for this process: S-edit - a schematic capture tool
The EDIT program provides two editors—EDIT, a line editor, and EDIT VS, a screen editor. The emphasis of this manual is on EDIT. The manual introduces you to the features and capabilities of EDIT, describes the many EDIT commands and their ranges, and provides information on creating and using EDIT files. For those users who wish to use EDIT .
edit to need resources beyond this tutorial, it is recommended that they refer to the L-Edit User's Guide which can be found in the help menu of the L-Edit program. . go to your start menu and access Tanner EDA - Utilities - Licensing Environment. Here you will receive a window like what is shown below. Select the option "All licenses .
SPICE es típicamente parte de una Suite EDA ¿Qué significa EDA? Los programas para diseño electrónico se denominan de forma genérica Software de Automatización de Diseño Electrónico , o EDA (por su sigla en inglés) Una suite EDA incluye programas de: captura (edición) de esquemáticos, simulación (SPICE),
Exploratory Data Analysis (EDA) is about getting an overall understanding of data. EDA includes exploring data to find its main characteristics, identifying patterns and visualizations. EDA provides meaningful insights into data to be used in a variety of applications e.g,. machine learning. Python can be effectively used to do EDA as it
Posada-Quintero et al. / Sensors and Actuators A 257 (2017) 84-91 85 Fig. 1. Ag/AgCl hydrogel electrodes (left) and CSA electrodes (right) for EDA mea-surements. suitable for EDA measurements, because of the finger's anatomy and the nature of the EDA signal. Most EDA devices involve the application of an external con-stant
