EECS 517 / NERS 578: Physical Processes In Plasmas Fall .
EECS 517 / NERS 578: Physical Processes in PlasmasFall 2012 - TuTh 10:30 AM - 12:00 PM - 1012 EECSInstructor: Mark J. Kushner2236 EECS Building (734-647-8148)Office Hours: Afternoons or by appointmente-mail: mjkush@umich.eduGoals of Course: This course addresses the fundamental science and technology of lowtemperature, partially ionized, non-equilibrium plasmas. This class of plasmas is used, forexample, for etching and deposition of materials, surface treatment, lighting sources, flat paneldisplays, welding, laser ablation, lasers and biomedical applications. These plasmas are alsonaturally occurring, such as the aurora, shock waves and lightning. The objectives of this courseare to first provide a foundation of the fundamentals of electron-atom collisions, electron and iontransport and the different ways in which low temperature plasmas are created. After providingthis foundation, the course will apply those fundamentals to study of the technologies which usepartially ionized plasmas, with examples taken from lasers, plasma materials processing, lightingsources and plasma medicine.Grading Policy: The field of low temperature plasmas is intrinsically interdisciplinary. Thelinkages between the supporting fields are best appreciated by problem solving in a real-worldcontext. As a result, one will not be able to fully benefit from the course without putting a goodfaith effort into the homeworks. To acknowledge the importance of homework, it is beingheavily weighted in the grading policy. The grading policy will be:HomeworkMid-Term ExamFinal ProjectInstructor's discretion30%30%30%10%Instructor's discretion includes my qualitative assessment of students' effort towards the course(e.g., class attendance and participation).Introduction-1
Texts:Required:M. Lieberman, Principles of Plasma Discharges and Material Processing, 2ndEdition (Wiley, New Jersey, 2005)Optional Text:A. Friedman and L. A. Kennedy, Plasma Physics and Engineering(Taylor and Francis, New York, 2004)Note that both of these texts are available electronically through a subscription by the UMEngineering Library.It may interest you and your students to know that the library has purchased access to e-bookversions of these texts."Principles of Plasma Discharges and Materials Processing" can be accessed online sma Physics and Engineering" can be accessed online rnate Meeting Time:Prof. Kushner would like to schedule an alternate meeting time for classes that are misseddue to travel. A signup sheet will be provided to indicate times that are good for you.Course Website: A combination of CTools and a separate course website will be used todistribute materials and for class communications. The alternative course website is located at:http://uigelz.eecs.umich.edu Classes EECS 517The materials that will be posted on the website include:1. Introductory materials2. Homework assignments3. Handout Packages (Note that some, but NOT ALL of the handouts can also bedownloaded individually!)4. Class announcements (such as cancellations, rescheduled classes, exam dates)Introduction-2
EECS 517/NERS 578 Fall 2012Course Map"Gaseous Electronics is the study partially ionized gases and their applicationto technologically relevant devices."MICROSCOPIC MACROSCOPICElectron collisionsCross sections, rate coefficientsGas discharge theoryElectron production, lossSheathsElectron distribution functionsTransport coefficientsLow pressure dc discharge devicesHigh pressure discharges ande-beam pumped plasmasrf and microwave dischargesDiagnosticsApplications:Plasma etchingToxic Gas RemediationSpecial TopicsCourse Map-1
EECS 517/NERS 578 Fall 2012Syllabus and Reading Assignments (Version 03)Reading assignments in Lieberman are required. Others are recommendations for background.TopicClassUnitI Introduction1II Electron CollisionsReading Assignments (Chapters orsections)LiebermanFridman112,33,8, Appendix A2,34,53,82,36277,8,92,54.510,116.1-6.5, Handouts6.1122, Appendix B4.1-4.21356IX Low Pressure DC Discharges1410,147.12-7.8X High Pressure Discharges and Electron BeamPumped PlasmasXI RF and Microwave Discharges16Handouts1217,1811,1210.5-10.6, 10.9194, HandoutsXIII Magnetic Fields in Discharges2046.2XIV Inductively Coupled Plasmas211210.7226.6III Cross Sections and Rate CoefficientsIV Gas DischargesV Electron Continuity Equation, Diffusion,Production, LossVI SheathsVII Electron Distribution FunctionsVIII Transport CoefficientsXII Fully Ionized PlasmasXV DiagnosticsXVI Atmospheric Pressure PlasmasXVII Plasma Chemistry23,2425XVIII Applications and Special Topics (to be973.726,27selected by class)a. Plasma Etching/Deposition/Surface9, 15, 16Chemistryb. ECR and Helicon13.1,13.210.8c. Plasmas in LiquidsHandoutsd. Plasma MedicineHandoutse. Dielectric Barrier DischargesHandouts9.3Required:M. Lieberman, Principles of Plasma Discharges and Material Processing, 2ndEdition (Wiley, New Jersey, 2005)Optional Text:A. Friedman and L. A. Kennedy, Plasma Physics and Engineering(Taylor and Francis, New York, 2004)Syllabus-1
EECS 517/NERS 578 Fall 2012Class Schedule (Version 03)The class schedule is listed below. Due to my travel commitments this Fall, we have scheduled alternatemakeup lectures. The times and locations of the alternate classes will be determined .Alternate Classes:Date19 Oct. Friday26 Oct. Friday7 Dec. FridayTime12-1 pm2-3 pm1-2 pmRoomEECS 1008EECS 1012EECS 1012Syllabus-2
EECS 517/NERS 578 Fall 2012Class Schedule: Tu/Th 10:30 am -12:00 noon, EECS 1012 (Version TTh4611131820252724911161814F19CommentApproximate (!) Topic (See Syllabus forReading Assignment)IntroductionElectron CollisionsElectron CollisionsCross Sections and Rate CoefficientsCross Sections and Rate CoefficientsGas DischargesElectron Continuity, Diffusion, SourcesElectron Continuity, Diffusion, SourcesElectron Continuity, Diffusion, SourcesSheathsSheathsElectron Energy pt.Oct.Oct.Oct.Oct.Oct. Fall Study BreakOct.Electron Energy Distributions andTransport CoefficientsOct. Alternate Meeting, Low Pressure DC Discharges12-1 pm,EECS TThTThTThTTh3016813152022TThTThF2729467Oct. MJK TravelNov.Nov.Nov.Nov.Nov.Nov.Nov. ThanksgivingRecessNov.Nov.Dec. MJK TravelDec.Dec. Alternate Class, 1-2TF1114MJK TravelAlternate Meeting,2-3 pm,EECS 1012Mid-Term ExamLow Pressure DC DischargesLow Pressure DC DischargesHigh Pressure and e-beam pumped plasmasRF DischargesRF DischargesFully Ionized PlasmasMagnetic Fields in DischargesInductively Coupled PlasmasDiagnosticsAtmospheric Pressure PlasmasPlasma ChemistrySpecial Topics – or Project Presentationspm, EECS 101227Dec.Dec. Final ProjectDue (5:00 pm)Special Topics – or Project PresentationsSyllabus-3
EECS 517/NERS 578 Fall 2012Supplementary Texts and References** On Reserve at UM Engineering LibraryJ. R. RothIndustrial Plasma Engineering. Vol 1 & 2Practical view of low temperature plasma physics froman engineering perspective.A. Fridman & L. A. Kennedy Plasma Physics and EngineeringComprehensive text on low temperature plasmas****A. FridmanPlasma Chemistry**Physics of low temperature plasmas and application to gas phase and surface chemistry.C. K. Birdsall & A. B. LangdonPlasma Physics via Computer Simulation**Introductory text on the use of Particle-in-Cell simulations for modeling plasmas.P. Chabert & N. Braithwaite Physics of Radio-Frequency PlasmasRecent monograph on RF discharges of the type used for plasma materials processing.M. MitchnerPartially Ionized GasesMostly for fully ionized plasmas but good treatment of sheaths,continuity equations, and electron-ion collisions.**G. BekefiPrinciples of Laser PlasmasSpecialty items such as recombination, discharge stability andvibrational excitation.L. M. Biberman, et al.Kinetics of Nonequilibrium Low-Temperature PlasmasGood general reference but difficult to read. (Russian Translation)S. C. BrownBasic Data of Plasma PhysicsClassic but dated text for basic topics.B. ChapmanGlow Discharge ProcessesGood “gut level” monograph. Good source for RF discharges.F. F. ChenIntroduction to Plasma PhysicsFully ionized plasmas with good treatment of Debye lengths, and magnetic field effects.B. CherringtonGaseous Electronics and Gas LasersClassic but dated text. Good basic introduction.Supplementary Texts-1
EECS 517/NERS 578 Fall 2012J. CobineGaseous ConductorsClassic, but dated test. Extremely empirical treatment of topics but good presentation.(You can learn something from this book on the first reading.)L. HuxleyDiffusion and Drift of Electrons in GasesAdvanced monograph on Boltzmann Equation and Transport Coefficients.U. KortshagenElectron Kinetics and Applications of Glow DischargesProceedings of NATO Workshop. Very good overview articlesL. LoebBasic Processes of Gaseous ElectronicsClassic and comprehensive text, but very dated.D. Manos and D. FlammPlasma Etching: An IntroductionCompilation on methods in plasma processing.T. MarkElectron Impact IonizationThorough treatment of electron impact collisions producing ionizationE. McDanielIon Molecule ReactionsAdvanced monograph on reactions between ions and neutralatoms/molecules. Good tables of reaction rate coefficients.L. C. Pitchford, et al.Swarm Studies and Inelastic Electron-Molecule CollisionsCompilation of papers on fundamental studies in nonequilibriumelectron transport and obtaining cross sections from swarm data.Y. RazierGas Discharge PhysicsIf you are going to buy a second text, get this one. It has all thematerial that’s important, but is difficult to read.Y. RazierRadio Frequency Capacitive DischargesExhaustive treatment of this important discharge device for plasma etching.S. RossnagelHandbook of Plasma Processing TechnologyCompilation of papers on basics of plasma etching and deposition.B. M. SmirnovPhysics of Ionized GasesGood general reference but difficult to read. (Russian Translation)Supplementary Texts-2
EECS 517/NERS 578 Fall 2012A. von EngelIonized GasesCollection of lectures given at Oxford. Considered a classic for introduction to field.A. von EngelElectric Plasmas; Their Nature and UsesSimplified view of gas discharges but good introduction.J. WaymouthElectric Discharge LampsDefining text for fluorescent lamp physics.M. Larousii et al.Plasma MedicineMulti-author collection of basic concepts in plasma medicine.Supplementary Texts-3
EECS 517 / NERS 578 Fall 2012ProjectsInstead of a final exam, there will be a final project. The project should consist ofdeveloping a model for, or performing an in depth analysis of, a low temperature plasma orelectric discharge system. Some possible choices of electric discharge systems are: Plasma processing reactorsFluorescent lampsHe-Ne, excimer, CO2 lasersSputter deposition reactorsE-beam pumped systemsArc jets and plasma thrustersThe project should include a literature search to provide you with background on howthese devices operate and to see how other researchers have analyzed them. Some of the modelswhich appear in the literature are quite involved and complex. The intent of the project is not foryou to duplicate the complexity of those models. Rather, the intent is to give you some sense ofhow the device and the "final product" (e.g., laser power, deposition rate, etch rate) scales. Yourmodel should have at least the degree of sophistication of our homework assignments but shouldinclude real device parameters. For example, use the actual gas pressures, gas mixtures,dimensions, cross sections, currents, and voltages. (Note, you can obtain the real cross sectionsfor the majority of cases of interest by request from M. Kushner.)Your final project deliverables will consist of the written report and, optionally, apresentation to the class. The limit on length is 25 pages, though 25 pages are not required.(Fewer pages of higher quality are preferred.) Please include a description of the dischargesystem, how you have analyzed it, the scaling laws you developed and a discussion of what youhave learned. Generously use plots to display parametric results. Your analysis might includeissues such as: Due dates:Electron densitiesElectron and ion temperaturesCurrent density, powerdeposition, operating E/NEtch or deposition rates Electron or ion energy distributionsEfficiency of producing the "product"Densities of excited states. Spectrum of emitted light.Friday, December 14, 2011, 5:00 PMPaper copy to: Prof. Kushner officePDF copy to: mjkush@umich.eduProject-1
EECS 517 /NERS 578 Fall 2012Units and Best PracticeUnits prove to be a confusing aspect of this course. The units which are commonly in usein the field are the "standard" for this course. Unfortunately, the units are "mixed" (that is, amixture of cgs and mks). Some useful conversion factors are listed below. Some best practicesyou should follow are:1. ALWAYS perform a units analysis and perform a "sanity" check to determine that youranswer is reasonable. In most cases, "unreasonable" answers are a result of unit problems.For example, if your answer is that the argon ion density in a plasma etching reactor is 1050ions/cm3, your answer is unreasonable and you probably have a units problem. You knowyour answer is unreasonable since if the density is really 1050 argon ions/cm3, the mass of 10cm3 of the plasma would be equal to twice the mass of the earth.2. Never, ever be confused by expressing temperature in Energy Units (or vice-versa).Temperature in Energy Units ALWAYS MeansT (eV) kBT (eV)3. Unless specified otherwise, you final answers in homework problems should be expressed inthe following units.Electron energies or temperaturesAtomic or molecular energy or temperatureLengthElectron, atomic or molecular massElectron, atomic or molecular speedCross sectionMobilityDiffusion coefficientRates coefficient (1st, 2nd, 3rd order)Electric fieldsNormalized Electric FieldDensityPowerPower deposition (specific)Current densityUnits-1eVK or eVcmAMU or gcm/scm2 or A2cm2/V-scm2/ss-1, cm3/s, cm6/sV-cm-1V-cm-2 orTd (10-17 V-cm2)cm-3WW-cm-3Amps-cm-2
EECS 517 /NERS 578 Fall 2012Useful Conversion Factorsk 1.38 x 10-16 erg/K 1.38 x 10-23 J/K1 eV 1.6 x 10-12 ergs 1.6 x 10-19 J 11,594.2 Kq e 1.6 x 10-19 C (coulomb) 4.8 x 10-10 esu1 V 1 J/C 107 erg/C o 8.85 x 10-12 [F/m or C2/m-J] 8.85 x 10-14 [F/cm or C2/cm-J]me (electron mass) 0.911 x 10-27 g 0.911 x 10-30 kgE/N: 1 Td (Townsend) 10-17 V-cm2 10-21 V-m2 0.354 V/cm-Torr at (T 273 K)1 Å2 10-16 cm2 10-20 m21 atm 760 Torr 1.013 barPP(Torr)Gas Density: N kT 9.654 x 1018 T(K) cm-31 m3 106 cm3Units-2
EECS 517 /NERS 578 Fall 2012Useful Relationships 2 v meElectron speed for energy :1/ 2 5.93 x 107 ( (eV))1/2 cm/s 8kTe m eAverage electron thermal speed for temperature Te: v 1/ 2 kT Debye Length: D o e n q2 e 1/ 2 kT e 4 n q 2 e mks1/ 2 T ( eV ) 743 e ne cm 3 6.69 x 107 (Te(eV))1/2 cm/s1/ 2 cmcgsPlasma Frequency: n q2 p (radian/s) e m e o 1/ 2 1/ 2 4 n q 2 e me mksRate coefficient: cm 3 v (e.g. (e.g. N n kN ))k e s t µe v velocity cm/s ne q 2n cm 31 2.81 10 4 e 1me m cm m s m Electron Mobility: 1/ 2 radiansscgs cross section cm2Conductivity: 5.64 10 4 ne cm 3electron momentum transfer collision frequencyqme m 1.756 1015 cm 2 s 1 V sm Units-3
Michigan Institute for Plasma Science and EngineeringFall 2012 Seminar SeriesDate, Time, LocationSpeaker (Affiliation)Title, AbstractTuesday18 September 20121:30 ‐ 2:30 pm1017 Dow, U‐MProf. David GravesUniversity of California,BerkeleyBiomedical Applications of Ambient Gas Plasma: TheConfluence of Redox Biology and Plasma ScienceJointly sponsored by MIPSE and the Dept. of Chemicaland Biomolecular EngineeringWednesday19 September 20124:00 ‐ 5:00 pm1311 EECS, U‐MProf. Chan JoshiUCLAShocks and Wakes in PlasmasWednesday3 October 20123:15 ‐ 4:15 pm1345 EngineeringBuilding,MSU, East LansingProf. Konrad GelbkeFrom NSCL (National Superconducting CyclotronMichigan State University Facility) to FRIB (Facility for Rare Isotope Beams) atMSUSpecial Seminar opening the 3rd MIPSE GraduateStudent SymposiumWednesday10 October 20124:00 ‐ 5:00 pm1311 EECS, U‐MProf. Mounir LaroussiOld Dominion UniversityPlasma Medicine: Low Temperature Plasma as aTransformational Technology for the Healthcare FieldFriday12 October 20124:00 ‐ 5:00 pmWhite Auditorium(G906 Cooley), U‐MProf. John H. BooskeUniversity of Wisconsin‐MadisonBack to the Future: 21st Century InstructionInnovationsJointly sponsored by MIPSE and the Dept. of NuclearEngineering and Radiological SciencesWednesday7 November 20124:00 ‐ 5:00 pm1311 EECS, U‐MProf. Howard MilchbergUniversity of MarylandThe Extreme Nonlinear Optics of Air and Femto‐second Optical FilamentationWednesday5 December 20124:00 ‐ 5:00 pm1311 EECS, U‐MDr. Yevgeny RaitsesPrinceton Plasma PhysicsLaboratoryComplex Phenomena in Magnetized Plasmas in thePresence of Electron Emission
XVII Plasma Chemistry 25 7 3.7 Applications and Special Topics (to be selected by class) 26,27 a. Plasma Etching/Deposition/Surface Chemistry 9, 15, 16 b. ECR and Helicon 13.1,13.2 10.8 c. Plasmas in Liquids Handouts d. Plasma Medicine Handouts XVIII e. Dielectric Barrier Discharges Handouts 9.3
Chapter 517 — Mining and Mining Claims 2001 EDITION MINING CLAIMS (Veins or Lodes) 517.010 Location of mining claims upon veins or lodes 517.030 Recording copy of location notice; fee 517.040 Abandoned claims (Placer Deposits) 517.0
Lenawee County Department of Veterans Affairs 517-264-5335 . Home Help. Department on Aging 517-264-5280 . Seniors 60 and older can get help with small chores and light housekeeping . Homeless Education . Homeless Education Programs of Lenawee 517-266-4529 or 517-264-6640 Beth McCullough . Rent/Mortgage Assistance . Housing Help of Lenawee 517 .
Tutorial for Purchasing NERS Software Choose your billing method: Download NERS by going to your first clicking on “My Available Downloads” page that can be found on the home page of the site: Click on the “NERS Software (version 04.03.00)” link below to begin
Lenawee County Community Crisis Team dispatched from Community Mental Health 517-263-8905 or . Lenawee County Emergency Management 517-264-4759 Salvation Army 517-265-2038 Victim Service Unit, Lenawee County Sheriff's Department 517-263-0524 Domestic Violence Catherine Cobb 24/7 Hotline 1-800-874-5936 Catherine Cobb Administration 517-265 .
SOCCER OFFICE:578-8256 LSU SOCCER COMPLEX PRESS BOX:578-0636 LSU ATHLETIC DEPARTMENT:578-0628 TICKET OFFICE:578-2184 WEBSITE:www.LSUsports.net Q U I C K F A C T S PREVIEW 2004 Season Outlook 2 2004 Opponents 4 Roster Breakdown 8 MEETTHE TEAM Co-Head Coach Danielle Fotopoulos 10 C
Judul : Buku Panduan Profesi Ners Stase Keperawatan Keluarga 2. Penyusun : Puji Lestari, S.Kep., Ns., M.Kes (Epid) Ns. Puji Purwaningsih, S.Kep., M.Kep. 3. Unit Kerja : Prodi Pendidikan Profesi Ners Ungaran, 3 September 2020 Ketua Program Studi Ns.Sukarno, S.Kep., M.Kep NIDN. 0624128204 . viii . ix KATA PENGANTAR Puji dan Syukur kehadirat Tuhan Yang Maha Esa yang telah mencurahkan rahmat dan .
APLIKASI NANDA NIC & NOC Zuriati, S. Kep, Ners, M. Kep Melti Suriya, S. Kep, Ners, M. Kep Yuanita Ananda, S. Kep, Ners, M. Kep ISBN : 978-602-61574-2-7 . Sanksi Pelanggaran Pasal 72: Undang-Undang Nomor 19 Tahun 2002 tentang Hak Cipta 1. Barangsiapa dengan sengaja dan tanpa
piece of paper and draw an outline of your chosen animal or person. 2. sing and dance when they If you would like to make more than one of any animal or person, fold your paper a few times behind the outline. You could also cut out your outline and trace around it. 3. from things they may Think of how to connect your paper animals or people.
